Untrimmed current reference

Results at a glance

The same untrimmed current-reference architecture, implemented in three technologies.

Physical sign-off

DRC, LVS, antenna, density and latch-up checks.

Reliability review

Electromigration, IR drop, redundant supply vias and gate-oxide voltage.

Extracted-layout verification

PVT, process-plus-mismatch Monte Carlo and start-up verification.

View sign-off details →

Measure	65-nm bulk CMOS	22-nm FD-SOI	16-nm FinFET
Supply	1.2 V	0.8 V	0.8 V
Typical output	10.06 µA	10.03 µA	9.73 µA
Drawn macro area	1,790 µm²	1,715 µm²	1,282 µm²
Untrimmed 3σ accuracy	±17.87%	±20.84%	±18.70%
Typical temperature coefficient	58 ppm/°C	38 ppm/°C	58 ppm/°C
Own power, excluding two outputs	14.2 µW	18.0 µW	8.5 µW

Current-reference layouts in all three technologies shown at one scale — Signed-off layouts at one scale; 10-µm scale bar

All electrical values are post-layout simulation with extracted parasitics, not silicon measurements. Accuracy is untrimmed process-plus-mismatch Monte Carlo; see page 06 for limits and modelling basis.

Workflow and verification

Under one hour of human hands-on time, with engineer-directed design decisions.

Schematic first: corner, Monte Carlo and start-up cases were run before layout.
Layout by code: matched common-centroid groups, dummies, routing and fill were generated and reviewed.
Physical sign-off: DRC, LVS, antenna, density and latch-up were checked.
Reliability: electromigration at 85 °C, IR drop, redundant supply vias and gate-oxide voltage were reviewed.
Extracted verification: 45 PVT points, three seeds of process and mismatch Monte Carlo, and start-up cases.

Scope: multi-patterning colouring was not run at 22 or 16 nm. The 16-nm electromigration review used estimated limits. The 22-nm dummy arrangement was owner-approved, with its measured cost included in the results. These are post-layout simulations with extracted parasitics, not silicon.

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How the reference works

Opposing temperature trends are weighted into a nearly flat current.

Schematic of the MOS current reference and op-amp-regulated mirror — One architecture across the three processes

I = V_GS1/R1 + ΔV_GS/R0. V_GS1 falls with temperature, while the voltage difference between one and eight diode-connected devices rises. R1 and R0 set their weights.

The op-amp holds V_A = V_B; a PMOS mirror produces two nominal 10-µA copies: OUT feeds the bias generator and CHECK is a spare reference-check output.
A weak pull-up starts the self-biased loop. EN switches the whole reference off. Node-specific adaptations include 22-nm output clamps and short-unit resistor and gate structures at 16 nm.
A beta-multiplier alternative was simulated and rejected: 65-nm corners reached −18.2/+25.9% against ±20%; 22- and 16-nm temperature coefficients exceeded 1194 and 1461 ppm/°C against a 300-ppm/°C limit.

65-nm physical implementation

Bulk-CMOS layout, 30.22 × 59.23 µm = 1,790 µm².

Annotated 65-nm current-reference layout — Functional groups labelled; colour conveys function, not process layers

Matched PMOS mirror includes two branches and two output copies; MOS diodes use a 1:8 ratio; the op-amp input pair is matched.
Each matched group uses end dummies and identical neighbours and sits at least 5 µm from a well edge.
R1 and R0 are parallel poly strips of one width. Supply is 1.2 V.

22-nm physical implementation

FD-SOI layout, 36.8 × 46.6 µm = 1,715 µm².

Annotated 22-nm current-reference layout — Matched groups and interleaved resistor units in the signed-off FD-SOI layout

Continuous diffusion rows put each device centroid at the array centre (0.0-µm offset): 32-finger PMOS mirror, 18 diode devices, 16 op-amp input devices and 16 loads.
R1 and R0 use interleaved unit strips with end dummies.
The two-dummy row ends are an owner-approved exception to longer saturating dummies; its measured cost is included in the reported results. Supply is 0.8 V.

16-nm physical implementation

FinFET layout, 27.20 × 47.136 µm = 1,282 µm².

Annotated 16-nm FinFET current-reference layout — Common-centroid matched arrays in the signed-off FinFET layout

PMOS mirror: eight rows and 96 units. Diodes at 1:8 ratio use three rows; the op-amp pair uses four rows. Matched-group centroids have 0.0-µm offset.
R1 and R0 use 47 identical units in a 2 × 26 interleaved array with dummies.
Process rules led to short-unit resistors and stacked short-gate devices. Supply is 0.8 V.

Untrimmed accuracy

Process-plus-mismatch Monte Carlo on extracted layouts at tt, 27 °C and nominal supply.

Untrimmed output-current accuracy across the three technologies — Filled data include process and mismatch; open dots mark separate seeds

Technology	Process σ	Mismatch σ	Pooled 3σ	3σ by seed	Limit
65-nm bulk	5.63%	1.93%	±17.87%	18.09 / 17.46 / 18.05%	±20%
22-nm FD-SOI	6.69%	1.89%	±20.84%	20.30 / 21.78 / 20.49%	±22%
16-nm FinFET	5.56%	2.82%	±18.70%	17.63 / 19.84 / 18.57%	±20%

Three seeds of 200 process plus 200 mismatch runs each; pooled 3σ = 3 × √(process σ² + mismatch σ²). 22-nm accuracy uses the technology’s best-case mismatch model, the design basis; the worst-case model gives ±25.9%. The 65-nm process runs were added for this presentation; its sign-off checked the 45-point corner box and mismatch σ.

Temperature stability

Output current from 0 to 85 °C relative to 27 °C, at nominal supply.

65-nm current reference versus temperature — 65-nm bulk CMOS: 58 ppm/°C at tt; 39–73 ppm/°C over process corners

22-nm current reference versus temperature — 22-nm FD-SOI: 38 ppm/°C at tt; 16–67 ppm/°C over process corners

16-nm current reference versus temperature — 16-nm FinFET: 58 ppm/°C at tt; 24–110 ppm/°C over process corners

Blue shows the typical process; grey shows four other process corners. The acceptance limit is 300 ppm/°C. Temperature coefficient is the largest-to-smallest current span, divided by the 27 °C current and by 85 K.

Reliable start-up

The circuit must leave its zero-current state for fast and slow supply ramps.

Technology	Passing cases	Conditions	Settled to 1%
65-nm bulk	135 / 135	45 PVT points × 1-ns step, 10-µs ramp, 1-ms ramp; extracted reference + bias generator	≤0.68 µs
22-nm FD-SOI	135 / 135 schematic; 3 / 3 extracted	Three near-latch corners post-layout with all supply ramps; no second state in 1000 Monte Carlo runs	≤0.36 µs
16-nm FinFET	93 / 93	45 PVT points × step and 10-µs ramp; 1-ms ramp at three points; extracted reference + bias generator	≤0.689 µs

65-nm current-reference startup waveform — Typical 65-nm corner after a 1-ns supply step, with extracted layout

Settling is measured after the supply step, within 1% of final current. At system integration, consumer blocks are enabled at least 2 µs after the reference.

Performance summary

Key extracted-layout metrics from the final public results; worst case across 45 PVT points unless noted.

Measure	65-nm bulk	22-nm FD-SOI	16-nm FinFET
Area	1,790 µm²	1,715 µm²	1,282 µm²
Supply ±5%	1.2 V	0.8 V	0.8 V
Output, typical	10.06 µA	10.03 µA	9.73 µA
Accuracy, untrimmed 3σ	±17.87% (limit ±20%)	±20.84% (limit ±22%)	±18.70% (limit ±20%)
Process corners, 45 PVT points	−8.6 / +13.4%	−11.6 / +16.1%	−12.3 / +12.6%
TC, tt (corner range)	58 (39–73) ppm/°C	38 (16–67) ppm/°C	58 (24–110) ppm/°C
Line regulation	≤0.49 %/V	≤0.72 %/V	≤0.26 %/V
PSRR at DC, worst	42.1 dB	44.0 dB	49.9 dB
Own power, typical	14.2 µW	18.0 µW	8.5 µW
Start-up	135/135 cases	3/3 extracted near-latch corners	93/93 cases

Current-reference output distributions over 45 PVT points — Post-layout current under the 45-point process, voltage and temperature box

Own power excludes the two output currents. The 22-nm 3σ figure uses the best-case mismatch model. Line regulation is the 27-°C per-corner measure; PSRR is normalized DC worst-of-box. These are post-layout simulations with extracted parasitics, not silicon.